nProber IV System
nProber IV System
Thermo Scientific™

nProber IV System

Nanoprobing platform for the localization of transistors and metallization faults as well as efficient sample preparation for TEM semiconductor failure analysis of high-productivity, 5-nm-capable electrical characterization.
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Catalog number NPROBERIV
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The Thermo Scientific nProber IV System is a high-performance scanning-electron-microscopy-based platform for the localization of transistor and metallization faults. It is our most advanced nanoprobing system to date, and the first to use the high-resolution LEEN2 SEM Column. The nProber IV System is specifically designed to increase the speed, accuracy, and output of your failure analysis (FA) workflow, where productivity is paramount.

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Key Features

  • Leading edge transistor probing
    nProber IV SteadFast Nanomanipulators and temperature-controlled probing environment combine to give the probe the necessary stability for working with leading-edge transistors.
  • High-resolution imaging of sensitive samples
    The new LEEN2 Column of the nProber IV System enables low eV imaging and probing operation and includes an advanced control system that reduces sample dose by up to 30%. These advances allow the nProber IV System to provide accurate measurements of critical transistor parameters with minimal shifts from SEM imaging.
  • Guided operation and automation
    The nProber IV System is equipped with eFast semi-automated guided workflows that take you through system operation from sample loading to electrical characterization. eFast Software automates the setup of the LEEN2 Column and controls key sub-systems ensuring consistent results in a multi-user production environment.
  • 3D structures
    The nProber IV Systems can be equipped with EBIRCH2 and EBAC to find critical faults in 3D interconnect structures down to ∼100 Ω. EBIRCH2 can also be used to localize critical defects in FinFET transistors. In addition, the nProber IV System can be equipped with a sub-stage that enables probes to be separated by many millimeters, essential for the isolation of faults in large 3D NAND structures.
  • Resistive gate faults
    The nProber IV Systems can isolate resistive gate faults utilizing high-speed pulsed probing with rise times of less than 1 ns.
  • Automation
    Our easyProbe Software automates key steps in the nProber IV workflow including: cleaning the probes, lowering the probes to the sample, and optimizing the electrical contact between the probes and the sample. easyProbe Software significantly reduces the training required to use the nProber IV System and allows for extended periods of unattended operation.
  • Automotive reliability
    The optional Thermal Characterization Package supports the most recent automotive reliability standards. Samples temperatures can be controlled from -40°C to 150°C in order to isolate faults that are not detectable at ambient temperatures.
Specifications
DescriptionNanoprobing for electrical fault isolation and efficient TEM workflows to improve semiconductor failure analysis.
ResolutionLEEN2™ SEM Column
TypeFIB-SEM
Unit SizeEach