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Date: 20 June 2025
Conference time: 9 a.m. to 6 p.m. GMT +7
Location: Novotel Bangkok Future Park Rangsit, Thailand
At SPARK Thailand 2025, you will have the opportunity to explore our latest innovative Thermo Scientific instruments and their use cases, including the ELITE+ System, compliance test solutions, Helios 6 HD FIB-SEM, and the Talos (S)TEM. Discover groundbreaking advancements in materials science and semiconductor failure analysis solutions and learn about our specialized analytical workflow solutions tailored for memory, compound power, and advanced packaged device applications.
Experience how our electrical and physical failure analysis solutions empower you to evaluate defects, perform precise metrology, and uncover buried defects in even the most challenging semiconductor devices.
Bonus: Bring your samples for a FREE live demo of the Thermo Scientific Phenom Desktop SEM during SPARK Thailand. Our experts will assist you in discovering the capabilities of this compact and user-friendly system. Don’t miss this opportunity!
| Start | End | Min | Topic |
9:00 a.m. |
9:45 a.m. |
45 | Registration & Networking |
9:45 a.m. |
10 a.m. |
15 | Opening Speech |
10:00 a.m. |
10:30 a.m. |
30 | ELITE System Innovations: Transforming FA with Next-Gen Features |
10:30 a.m. |
11:00 a.m. |
30 | Revolutionizing Failure Analysis with CTS: Tool Introduction and Practical Use Cases |
11:00 a.m. |
11:30 a.m. |
30 | Field service team update |
11:30 a.m. |
12:00 p.m. |
30 | Applications of Phenom Desktop SEM |
12:00 p.m. |
1:30 p.m. |
90 | Lunch Break |
1:30 p.m. |
2:00 p.m. |
30 | Guest presentation |
2:00 p.m. |
2:30 p.m. |
30 | Apreo ChemiSEM System: High-Resolution Imaging and Elemental Analysis |
2:30 p.m. |
3:00 p.m. |
30 | Helios 6 HD FIB-SEM: Advanced TEM Sample Preparation for High-Precision and High-Productivity Semiconductor Analysis |
3:00 p.m. |
3:30 p.m. |
30 | The Latest Updates of Helios 5 Plasma FIB-SEM and Applications |
| 3:30 p.m. | 4:00 p.m. | 30 | Tea break |
| 4:00 p.m. | 4:45 p.m. | 45 | Applications of Next-Gen High-Throughput XPS in Semiconductor Surface Analysis |
| 4:45 p.m. | 5:30 p.m. | 45 | Talos F200E (S)TEM: The Standard Lab-Based S/TEM Solution for Semiconductor FA and R&D Applications |
| 5:30 p.m. | 6:00 p.m. | 30 | The Next Generation of Multi-Modality Image Analysis Solution: AI and Machine Learning Evolution |
| 6:00 p.m. | 8:00 p.m. | 120 | Networking dinner |