Precision redefined at the nanoscale

The Thermo Scientific Helios 5 DualBeam combines innovative SEM and STEM imaging with precise gallium ion milling to enable outstanding results for nanoscale research. As the ultimate instrument for preparing TEM lamellae and APT samples, the Helios 5 DualBeam also excels in many other tasks. Perform 3D structural analysis, capture volumes of cells and tissues, or reveal and characterize sub-surface defects; the Helios 5 DualBeam helps make workflows faster, more consistent, and more reliable.


High-resolution SEM and STEM imaging at sub-nanometer scale

Achieve sub-nanometer resolution with the advanced Thermo Scientific Elstar Electron Column. The Helios 5 DualBeam features both SEM and STEM imaging capabilities, revealing fine features in materials, devices, and nanostructures. From grain boundaries to transistor-level thin films, every image carries maximum clarity and confidence.


Ultimate TEM lamella preparation

Preparing lamellae for transmission electron microscopy (TEM) is one of the most critical—but challenging—tasks in advanced materials and semiconductor device analysis. The Helios 5 DualBeam excels in producing high-quality, ultra-thin, site-specific lamellae with minimal damage, accelerating atomic-level characterization.


Intelligent automation for consistent, high-quality FIB-SEM workflows

With Thermo Scientific AutoTEM Software and other applications, automated beam alignments, and guided workflows, the Helios 5 DualBeam drastically reduces operator variability and training time. Even novice users can produce expert-level results, while advanced users benefit from greater throughput and reproducibility across complex experiments and physical failure investigations.


Fast and precise 3D analysis

Obtain high-resolution, multi-modal 3D information about your sample with flexibility and throughput, helping ensure you collect a comprehensive set of data. Reconstruct your volume and visualize in 3D with Thermo Scientific Avizo Software.


Rapid nanoprototyping

Fast, accurate and precise milling and deposition of complex structures with critical dimensions of less than 10 nanometers.


Workflow reliability and throughput

Designed for demanding research and engineering environments, the Helios 5 DualBeam combines precision with consistency. Automated routines help ensure repeatable performance, while robust hardware supports high-throughput labs where uptime and reproducibility matter most.


For Research Use Only. Not for use in diagnostic procedures.