Focused ion beam scanning electron microscopy
学术界和工业界的科学家和工程师不断面临着需要对各种样品和材料进行高度局部表征的新挑战。提高这些材料质量的持续动力意味着常常需要纳米级的结构和组分信息。DualBeam 聚焦离子束扫描电子显微镜 (FIB-SEM) 仪器通过将 FIB 的精确样品修饰与 SEM 的高分辨率成像相结合，正好完全这类数据。
赛默飞世尔科技是 FIB-SEM 技术的行业领导者，在 DualBeam 仪器方面拥有超过 25 年的经验。我们为一系列应用提供了广泛的产品组合和先进的自动化能力，包括透射电镜 (TEM) 样品制备、亚表面和 3D 表征、纳米原型设计和原位实验。
TEM sample preparation
TEM sample preparation is considered to be one of the most critical tasks in materials science research. However, it is also one of the most challenging and time-consuming. The latest technological innovations of DualBeam technology, along with our comprehensive software solutions and application expertise, enable fast and easy preparation of site-specific, high-quality S/TEM (scanning/transmission electron microscopy) samples for a wide range of materials. Thermo Scientific AutoTEM Software adds the capability for fully automated, unattended in situ TEM sample preparation, significantly increasing throughput and bringing you expert-level results regardless of your experience.
When combined with Thermo Scientific Auto Slice & View Software, DualBeam instruments provide 3D insight into sample structure by selectively removing (milling) the material for subsurface characterization. Digital reconstruction generates multi-modal 3D datasets that can consist of a variety of signals, including backscattered electron (BSE) imaging for maximum materials contrast, energy dispersive spectroscopy (EDS) for compositional information, and electron backscatter diffraction (EBSD) for microstructural and crystallographic information.
The SEM capability of DualBeam instruments offers nanoscale details across a wide range of working conditions, from structural information obtained at 30 keV in STEM mode to charge-free, detailed surface information at lower energies. With unique in-lens detectors, DualBeam systems are designed for simultaneous acquisition of angular/energy-selective secondary-electron and BSE data. Fast, accurate, and reproducible results are provided by our unique SEM column design, which features fully automated lens alignments.
The nanopatterning capabilities of DualBeam systems can substantially reduce research and development time. Rapid prototyping with the FIB enables functionality testing before the final device layout is established for batch fabrication. Beam-induced deposition of different materials can be combined with FIB milling without the need for additional aligning lithography steps; patterns can be directly added to deposited structures or existing patterns can be modified. The final patterned substrates are immediately available for further processing or characterization.