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The Thermo Scientific Helios 5 PFIB DualBeam is engineered for high-throughput characterization and gallium-free workflows, enabling scientists and engineers to investigate large-scale or sensitive structures while preserving nanoscale detail. By pairing a xenon plasma ion source with high-resolution SEM imaging, the Helios 5 PFIB DualBeam delivers faster milling, pristine samples, and deeper insight into material performance and device structures.
The high-current xenon plasma ion source removes material far faster than traditional gallium FIBs, making it ideal for large-volume excavations, cross-sectioning, and 3D tomography. Researchers can quickly expose subsurface features or prepare wide trenches without compromising imaging detail.
Because xenon ions avoid gallium implantation, the PFIB is perfect for sensitive samples such as aluminum alloys, lithium batteries, and polymers. This helps ensure clean, uncontaminated lamellae for high-resolution S/TEM analysis, preserving true material chemistry and avoiding artifacts. Thermo Scientific AutoTEM Software enables fast, easy, automated, multi-site, in situ and ex situ TEM sample preparation.
The monochromated Thermo Scientific Elstar UC+ SEM Column provides outstanding electron-beam performance, revealing comprehensive sample information. Sharp, refined, charge-free contrast is obtained from up to six integrated in-column and below-the-lens detectors.
Advanced low-kV polishing helps ensure atomic-scale features remain intact for ultra-thin TEM sample preparation. Its combination of speed and precision makes the Helios 5 PFIB DualBeam a true workhorse for both high-throughput and high-quality sample preparation.
Seamlessly integrates PFIB milling with advanced SEM imaging and analytical techniques (EDS, EBSD, STEM-in-SEM). This enables multi-modal 3D datasets that combine structural, chemical, and crystallographic information for advanced material characterization.
Use Thermo Scientific Avizo Software to reconstruct, visualize, register, and segment 3D data.
Leverage proprietary Dx Delayering gas chemistry, delivered by the flexible, multiple chamber MultiChem Gas Injection system, combined with Xe-ion beam to remove nanometers of material at a time, revealing transistor-level detail without affective electrical performance.
Precise sample navigation is essential for high-quality results in diverse applications. The Helios 5 PFIB DualBeam ensures exceptional accuracy with its 150 mm Piezo stage and optional in-chamber Nav-Cam. This system provides high stability and tailored navigation, minimizing errors and maximizing efficiency in most operations.
For Research Use Only. Not for use in diagnostic procedures.